Department of Physics, Kongunadu Arts and Science College, G.N. Mills, Coimbatore - 641 029, Tamil Nadu, India
*Corresponding author: E Mail: hbcss@yahoo.com
Online published on 7 April, 2014.
Thin films of poly (methyl methacrylate) (PMMA) were prepared by spin coating the solution of PMMA on to p-Si substrate. FTIR spectrum was used to identify the above said films. C-V and I-V behavior of the MISM structures with Aluminum/PMMA/p-Si/Aluminum have been studied. The C-V behavior was studied for various frequencies (f) from 20 kHz to 1 MHz and for a bias voltage range of -20 V to +20 V. As grown films showed a flat band voltage (VFB) shift towards the positive voltage whereas annealed films showed a decrease in VFB shift and it moved towards the zero flat band voltage (VFB ≍ 0) value. Low leakage current was observed in the I-V characteristics for the voltage range studied. The ideality factor (n) was found to be ≍ 7 for the as grown film. The absence of hysteresis in the I-V characteristics for the forward and reverse sweep direction eliminates the presence of deep traps in the PMMA thin films
PMMA, dielectric, annealing, capacitance-voltage, current - voltage, ideality factor (n)