Holography and Materials Research Lab., Department of Physics, Shivaji University, Kolhapur, Maharashtra- 416004, India
*Corresponding Author E-mail: Vpyash07@gmail.com
Online published on 13 March, 2013.
Double Exposure Holographic Interferometry (DEHI) is one of the most important applications of Holographic Interferometry. The reported technique, double exposure holographic interferometry used together with simple mathematical interpretation, which allow immediate finding of stress, mass, fringe width and thickness of thin film. It must be further noted that, fringe spacing changes with time of deposition as well as solution concentration. We have tested the samples for different normalities of solutions. The structural study was carried out by XRD for the conformation of material.
DEHI, Exposure, Stress, Fringe Width, Thin Film