Bulletin of Pure & Applied Sciences- Chemistry
  • Year: 2013
  • Volume: 32c
  • Issue: 1

Electronic and structural properties of vacancies and antisites of silicon carbide and CS1 nanotubes

  • Author:
  • Veena Kumari1a,1b, Asim Kurt"ar2, Satvendra Kumar Singh3, Sunita Kumari4, Saroj Kumar5, Ratikant Chaudhari6
  • Total Page Count: 4
  • Page Number: 21 to 24

1aDepartment of Chemistry, Samta College, Jandaha, Vaishali, Bihar, India

2Department of Electronics and Communication Eng., MACET, Patna, (Bihar), India

3Department of Chemistry, A.B.S. College, Lalganj, Vaishali, (Bihar), India

4Research Scholar, Department of Chemistry, J.P. University, Chapra, Saran, (Bihar), India

5Research Scholar, Department of Chemistry, J.P. University, Chapra, Saran, (Bihar), India

6Department of Chemistry, A.B.S. College, Lalganj, Vaishali, (Bihar), India

1bB.R.A.B.U., Muzaffarpur, Bihar, India

Online published on 6 December, 2013.

Abstract

We have studied the energetic, stability, equilibrium geometries and electronic properties of neutral native defects in SiC nanotubes and Csi. We found that calculations show that silicon carbon nanotubes are always semiconducting. The energy band gap of these tubes is weakly dependent on their chirality with direct band gaps for zigzag tubes (n, 0) and indirect gaps for armchair and chiral tubes. Silicon carbon nanotubes are produced by SiD reaction with carbon nanotubes at about 1200°C and the formation by numerous native defect are found. The calculations were made by first principles density function theory, using the local spin density approximation for the exchange correlation term. We found that SiC defects, C-rich exhibit the lowest formation energies followed by CSi at Si-rich conditions. Electronic structure of these defects is an empty electronic level close to the bottom of the conduction band. The use of nonzero electronic temperature promotes a partial occupation of the almost degenerate levels within the nanotube gap.

Keywords

Zigzag tubes, Silicon carbon nanotubes, SiD, SiC, Csi