Silar deposition of nanostructre cds thin films on glass substrates with ultrasonification

Glass substrate modified with ultrasonic cleaning were used to deposit CdS thin films in the process of successive ionic layer absorption and reaction [SILAR]. The films were characterized by X -ray diffraction, u. v. absorption and atomic force microscopy [AFM]. AFM showed that after ultrasonic cleaning substrate were in favor of the growth of films by comparison with the commercial glass slide. The deposition rate of the films was faster after the ultrasonification of glass substrate.