Fabrication and analysis of electrical behaviour of carbon nanowires by focused ion beam induced deposition technique

Present paper reports the fabrication of carbon nanowires on SiO₂ substrate using focused ion beam induced deposition and their electrical transport property studies. I-V characteristics of the nanowires have been investigated. The resistivities of the carbon nanowires fabricated by FIB are found to be more than that of the bulk crystalline graphite and nearly equal to bulk amorphous carbon. An increment in the resistivity has been explained on the basis of carbon allotropes. I-V characteristics of the nanowires fabricated in parallel combinations confirm the validation of resistance addition laws.