1Intelligent Mechanical System Engineering Department Kochi University of Technology, Kochi-782-8502, Japan.
2Mechanical Electronics Engineering Department, Harbin Institute of Technology, Harbin-150001, China.
*Corresponding Author, E-mail: 096402c@gs.kochi-tech.ac.jp
The fabrication in micro nano scale in nanotechnology world becoming greater and greater. Micro nano fabrication technologies serves several modern industries and technology especially IC industry, MEMS, solar cells, optoelectronics and flat panel display. In this current paper describes square hole fabrication in micro nano scale using ECR ion beam irradiation system on Silicon surface. Ar+4, were irradiated at 400keV accelerating energy through a stencil mask on Silicon. Finally the size of the fabricated square hole and surface roughness of fabricated portion were measured by AFM and discuss briefly.
Electron Cyclotron Resonance, ion beam irradiation, Atomic force microscopy
