International Journal of Engineering, Science and Mathematics
  • Year: 2017
  • Volume: 6
  • Issue: 4

A study on thin films deposition technique

  • Author:
  • Poonam
  • Total Page Count: 7
  • Page Number: 175 to 181

Research Scholar, Calorx Teachers’ University, Ahmedabad (Gujarat)

Online published on 19 April, 2019.

Abstract

Physical vapor deposition (PVD) is a process of transferring growth species (material) from a source or target and depositing them on a substrate to form a film. In this processno chemical reaction takes place. This process controllably transfers atoms from a source to a substrate where film formation and growth proceed atomistically.

Keywords

Generation of vapor, Tungsten wire sources, Sublimation Furnace, Layer by layer deposition by this technique, Physical processes