International Journal of Management, IT and Engineering
  • Year: 2019
  • Volume: 9
  • Issue: 6

Comparative study of mosfet, cmos & finfetbase

  • Author:
  • Ramakant, Raghvendra Singh
  • Total Page Count: 14
  • Page Number: 179 to 192

*M. Tech. Scholar, EC Department Faculty of Engineering & Technology, Andhana, Kanpur, Uttar Pradesh, India

**Assistant professor in Department electronic & communication engineering, Faculty of Engineering & Technology, Rama University, Kanpur, India

Online published on 24 October, 2019.

Abstract

In system technology, FinFETs are performed many ways to manipulate leakage cutting-edge, dynamic current, quick channel effects (SCE) and put off over MOSFET and CMOS. FETs are promising substitutes to address quick channel effects (SCEs) higher than the traditional planar MOSFET's at deeply scaled generation nodes and accordingly allow persevered transistor scaling. on this paper, reviewed the comparative take a look at of FinFET with specific parameter related to Channel period, Leakage current, electricity and postpone over MOSFET and CMOS.