1Central Electrochemical Research Institute, Karaikudi - 630006.
2Dr. Alagappa Chettiar College of Engineering and Technology, Karaikudi, 630002.
*Corresponding Author Email: dhadi.rajagopal@gmail.com
An eco-friendly Chemical Vapour Deposition (CVD) reactor was designed and fabricated. The operational sequence of the deposition process is explained. Oxides of copper using copper (II) acetylacetonate as the precursor and oxygen as the carrier gas were deposited using the above system. The thin films thus obtained were characterized by XPS, XRD, SEM and AFM techniques.
Chemical vapour deposition (CVD), Precursor, XPS, XRD, SEM, AFM
